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A semiconductor X is made by doping silicon with phosphorous. A second semiconductor Y is made by doping silicon with aluminium. The two are joined by a suitable technique to form a p - n junction and is connected to a battery such that Y is joined to negative of the battery and X to the positive of the battery. Which of the following statements is correct?

Options

  1. APotential barrier of the junction is raised and current is due to majority carriers
  2. BPotential barrier of the junction is zero and current is due to minority carriers
  3. CPotential barrier of the junction is raised and current is due to minority carriers
  4. DPotential barrier of the junction is lowered and current is due to minority carriers

Correct answer

C. Potential barrier of the junction is raised and current is due to minority carriers

Step-by-step solution

Silicon doped with phosphorous (a pentavalent impurity) forms an n-type semiconductor, denoted as X. Silicon doped with aluminium (a trivalent impurity) forms a p-type semiconductor, denoted as Y. The junction formed is a p-n junction where Y is the p-side and X is the n-side. The p-side (Y) is connected to the negative terminal of the battery, and the n-side (X) is connected to the positive terminal of the battery. This configuration corresponds to reverse biasing of the p-n junction. In reverse bias, the potentia

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