NEETPhysicsSemiconductors
In a silicon crystal doped with 5 × 10²⁸ atoms/m³ of arsenic to form an 'n' type wafer, and 1 ppm concentration of boron is added on the surface to create a 'P' region, given that the intrinsic carrier concentration (n i ) is 1.5 × 10¹⁶ m⁻³, what is the density of holes in the 'n h ' region?
Options
- A0.45 × 10¹⁶/m³
- B0.45 × 10²⁸/m³
- C0.45 × 10 10 /m³
- D0.45 × 10²¹/m³
Correct answer
C. 0.45 × 10 10 /m³
Step-by-step solution
Correct Option is : (C) 0.45 × 10 10 /m³